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Atomic Layer Deposition for Semiconductors Cheol Seong Hwang 2014 edition
Atomic Layer Deposition for Semiconductors
Cheol Seong Hwang
Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.
300 pages, 89 black & white illustrations, 81 colour illustrations, 3 black & white tables, 1 colour
| Media | Books Hardcover Book (Book with hard spine and cover) |
| Released | October 19, 2013 |
| ISBN13 | 9781461480532 |
| Publishers | Springer-Verlag New York Inc. |
| Pages | 263 |
| Dimensions | 155 × 235 × 20 mm · 521 g |
| Language | English |
| Editor | Hwang, Cheol Seong |