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Atomic Layer Deposition: Principles, Characteristics, and Nanotechnology Applications Tommi Kaariainen 2nd edition
Atomic Layer Deposition: Principles, Characteristics, and Nanotechnology Applications
Tommi Kaariainen
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective.
272 pages
| Media | Books Hardcover Book (Book with hard spine and cover) |
| Released | June 28, 2013 |
| ISBN13 | 9781118062777 |
| Publishers | John Wiley & Sons Inc |
| Pages | 272 |
| Dimensions | 240 × 164 × 25 mm · 582 g |
| Language | English |